Resist Requirements and Limitations for Nanoscale Electron-Beam Patterning
نویسندگان
چکیده
منابع مشابه
Electron beam lithography patterning of sub-10 nm line using hydrogen silsesquioxane for nanoscale device applications
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ژورنال
عنوان ژورنال: MRS Proceedings
سال: 2002
ISSN: 0272-9172,1946-4274
DOI: 10.1557/proc-739-h1.5